Dr. Weimin Ma
SPIE Involvement:
Publications (6)

Proceedings Article | 1 November 2007 Paper
Cathy Liu, Crystal Wang, Skin Zhang, Eric Guo, Steven Liu, Eric Haodong Lu, Dongsheng Fan, Den Wang, Weiming Ma
Proceedings Volume 6730, 67303P (2007) https://doi.org/10.1117/12.747189
KEYWORDS: Photomasks, Inspection, Reticles, Defect inspection, Logic, Crystals, Optical proximity correction, Defect detection, Lithography, Contamination

Proceedings Article | 1 November 2007 Paper
Eric Haodong Lu, Jim Wang, Raj Badoni, Ellison Chen, Weimin Ma
Proceedings Volume 6730, 67303Q (2007) https://doi.org/10.1117/12.747195
KEYWORDS: Air contamination, Reticles, Semiconducting wafers, Inspection, Remote sensing, Defect detection, Manufacturing, Lithography, Photomasks, Contamination

Proceedings Article | 25 October 2007 Paper
Dvori Stoler, Wayne Ruch, Weimin Ma, Swapnajit Chakravarty, Steven Liu, Ray Morgan, John Valadez, Bill Moore, John Burns
Proceedings Volume 6730, 67303L (2007) https://doi.org/10.1117/12.747302
KEYWORDS: Inspection, Photomasks, Databases, Manufacturing, Defect inspection, Semiconducting wafers, Mask making, Computed tomography, Optical proximity correction, Control systems

Proceedings Article | 4 November 2005 Paper
Proceedings Volume 5992, 599209 (2005) https://doi.org/10.1117/12.632338
KEYWORDS: Inspection, Defect detection, Photomasks, Contamination, Binary data, Defect inspection, Nanoimprint lithography, Deep ultraviolet, Semiconducting wafers, Mask making

Proceedings Article | 28 June 2005 Paper
Paul Yu, Vincent Hsu, Ellison Chen, Rick Lai, Kong Son, Weimin Ma, Peter Chang, Jackie Chen
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617488
KEYWORDS: Inspection, Reticles, Defect detection, Photomasks, Defect inspection, Manufacturing, Process engineering, Sensors, Image processing

Showing 5 of 6 publications
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