Dr. Weimin Ma
at
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 1 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Reticles, Logic, Contamination, Defect detection, Crystals, Inspection, Photomasks, Optical proximity correction, Defect inspection

Proceedings Article | 1 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Reticles, Contamination, Defect detection, Air contamination, Remote sensing, Manufacturing, Inspection, Photomasks, Semiconducting wafers

Proceedings Article | 25 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Databases, Manufacturing, Inspection, Control systems, Photomasks, Computed tomography, Optical proximity correction, Mask making, Semiconducting wafers, Defect inspection

Proceedings Article | 4 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Contamination, Defect detection, Deep ultraviolet, Inspection, Photomasks, Mask making, Nanoimprint lithography, Semiconducting wafers, Binary data, Defect inspection

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Reticles, Defect detection, Sensors, Image processing, Manufacturing, Inspection, Photomasks, Process engineering, Defect inspection

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Metals, Manufacturing, Inspection, Photomasks, Transistors, Semiconducting wafers, Yield improvement, System on a chip, Prototyping

Showing 5 of 6 publications
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