Parallel-coupled dual racetrack micro-resonator structures have potential applications for quadrature amplitude
modulation. Fabrication of parallel-coupled dual racetrack silicon micro-resonators was conducted, while overcoming
for some barriers to fabrication. Fabrication process limitations and design considerations are discussed. Fabrication
results are presented. Some barriers to fabrication include stitching and overdosing in electron beam lithography. A
multi-input and output test bed with optical and electrical control was necessary for device characterization. The
characterization of the fabricated devices is presented, along with the related procedures. Some of the tests performed are
wavelength scans and top surface scans.