Dr. Wen-Chuan Wang
at Taiwan Semiconductor Mfg
SPIE Involvement:
Publications (10)

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9423, 942310 (2015) https://doi.org/10.1117/12.2085100
KEYWORDS: Distortion, Thermal effects, Semiconducting wafers, Silicon carbide, Silicon, Finite element methods, Scattering, Thermal modeling, Electron beam lithography, Scanners

Proceedings Article | 28 March 2014 Paper
Allen Carroll, Luca Grella, Kirk Murray, Mark McCord, Paul Petric, William Tong, Christopher Bevis, Shy-Jay Lin, Tsung-Hsin Yu, Tze-Chiang Huang, T. Wang, Wen-Chuan Wang, J. Shin
Proceedings Volume 9049, 904917 (2014) https://doi.org/10.1117/12.2048528
KEYWORDS: Mirrors, Lithography, Semiconducting wafers, Error control coding, Reflectivity, Switching, Electrodes, Data compression, Printing, Electron beam lithography

Proceedings Article | 21 March 2012 Paper
Regina Freed, Thomas Gubiotti, Jeff Sun, Francoise Kidwingira, Jason Yang, Upendra Ummethala, Layton Hale, John Hench, Shinichi Kojima, Walter Mieher, Chris Bevis, Shy-Jay Lin, Wen-Chuan Wang
Proceedings Volume 8323, 83230H (2012) https://doi.org/10.1117/12.916090
KEYWORDS: Electron beam lithography, Semiconducting wafers, Electroluminescence, Lithography, Monte Carlo methods, Reflectivity, Electron beams, Direct write lithography, Silicon, Computer aided design

Proceedings Article | 4 April 2011 Paper
Proceedings Volume 7970, 79700Z (2011) https://doi.org/10.1117/12.869896
KEYWORDS: Raster graphics, Critical dimension metrology, Semiconducting wafers, Data transmission, Electron beam lithography, Tolerancing, Optical fibers, Maskless lithography, Electron beam direct write lithography, Mask making

Proceedings Article | 3 April 2010 Paper
S. Lin, W. Wang, P. Chen, C. Liu, T. Lo, Jack J. Chen, Faruk Krecinic, Burn Lin
Proceedings Volume 7637, 763717 (2010) https://doi.org/10.1117/12.848319
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Maskless lithography, Scattering, Electron beam lithography, Laser scattering, Electron beams, Image resolution, Electron beam direct write lithography, Manufacturing

Showing 5 of 10 publications
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