Dr. Wen-Chuan Wang
at Taiwan Semiconductor Mfg
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Electron beam lithography, Scattering, Scanners, Silicon, Distortion, Thermal effects, Finite element methods, Silicon carbide, Semiconducting wafers, Thermal modeling

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Electron beam lithography, Mirrors, Data compression, Switching, Electrodes, Reflectivity, Printing, Error control coding, Semiconducting wafers

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Silicon, Reflectivity, Electroluminescence, Monte Carlo methods, Computer aided design, Semiconducting wafers, Direct write lithography

PROCEEDINGS ARTICLE | April 4, 2011
Proc. SPIE. 7970, Alternative Lithographic Technologies III
KEYWORDS: Optical fibers, Electron beam lithography, Data transmission, Maskless lithography, Raster graphics, Mask making, Critical dimension metrology, Electron beam direct write lithography, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | April 3, 2010
Proc. SPIE. 7637, Alternative Lithographic Technologies II
KEYWORDS: Electron beam lithography, Electron beams, Scattering, Manufacturing, Laser scattering, Image resolution, Maskless lithography, Critical dimension metrology, Electron beam direct write lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | December 12, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Electron beam lithography, Electron beams, Manufacturing, Image resolution, Finite element methods, Photomasks, Line width roughness, Maskless lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 10 publications
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