Wen Jun Ling
at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Lithography, Mask making, Optical proximity correction, Manufacturing, Defect inspection, Scanners, Computer simulations

Proceedings Article | 3 October 2018 Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Plasma, Etching, Edge roughness, Oxides, Photomasks, Oxygen, Distortion, Plasma etching

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