Mr. Wen-Kuang Lin
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 25, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Optical design, Metrology, Deep ultraviolet, Etching, Scanners, Spectroscopy, Process control, Critical dimension metrology, Liquid crystal lasers, Single crystal X-ray diffraction

PROCEEDINGS ARTICLE | May 15, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Wafer-level optics, Lithography, Scanners, Manufacturing, Microelectronics, Photomasks, Lutetium, Critical dimension metrology, Semiconducting wafers, 193nm lithography

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Polishing, Quartz, Chromium, Printing, Microelectronics, Photomasks, Lutetium, Semiconducting wafers, 193nm lithography

PROCEEDINGS ARTICLE | May 17, 2005
Proc. SPIE. 5755, Data Analysis and Modeling for Process Control II
KEYWORDS: Metrology, Switching, Etching, Scanners, Spectroscopy, Control systems, Process control, Spectroscopic ellipsometry, Critical dimension metrology, Single crystal X-ray diffraction

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