Dr. Wen-Shiang Liao
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 31, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Electron beam lithography, Polymers, Water, Surface roughness, Surface properties, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Logic, Optical lithography, Metals, Scanners, Copper, Photomasks, Optical alignment, Semiconducting wafers, Signal detection, Tin

PROCEEDINGS ARTICLE | March 21, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Oxides, Optical lithography, Etching, Electrodes, Scanners, Scanning electron microscopy, Photomasks, Plasma etching, Plasma

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Metrology, Optical lithography, Etching, Coating, Inspection, Scanning electron microscopy, Process control, Photomasks, Semiconducting wafers, Temperature metrology

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical lithography, Etching, Scanners, Composites, Silicon, Photomasks, Plasma etching, 193nm lithography, Plasma

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Scanners, Photomasks, Field effect transistors, Plasma etching, 193nm lithography, Plasma

Showing 5 of 7 publications
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