Dr. Wen-Shiang Liao
at United Microelectronics Corp
SPIE Involvement:
Publications (7)

Proceedings Article | 31 March 2008 Paper
Proceedings Volume 6923, 692307 (2008) https://doi.org/10.1117/12.775542
KEYWORDS: Electron beam lithography, Photoresist processing, Polymers, Semiconducting wafers, Lithography, Immersion lithography, Water, Surface properties, Surface roughness, Thin film coatings

Proceedings Article | 26 March 2008 Paper
Wen-Shiang Liao, Hsin-Hung Lin, Yu-Huan Liu, Mao-Chyuan Tang, Sheng-Yi Huang, Cheng-Han Wu, Yue-Gie Liaw, Tung-Hung Chen, Tommy Shih, Kun-Ming Chen
Proceedings Volume 6923, 69233Y (2008) https://doi.org/10.1117/12.772286
KEYWORDS: Optical alignment, Tin, Photomasks, Copper, Semiconducting wafers, Signal detection, Scanners, Optical lithography, Metals, Logic

Proceedings Article | 21 March 2008 Paper
Wen-Shiang Liao, Cheng-Han Wu, Mao-Chyuan Tang, Sheng-Yi Huang, Tommy Shih, Yue-Gie Liaw, Kun-Ming Chen, Tung-Hung Chen, Huan-Chiu Tsen, Lee Chung
Proceedings Volume 6921, 69212N (2008) https://doi.org/10.1117/12.769591
KEYWORDS: Etching, Plasma, Plasma etching, Electrodes, Photomasks, Oxides, Optical lithography, Scanners, Scanning electron microscopy

Proceedings Article | 5 April 2007 Paper
Yu-Huan Liu, Wen-Shiang Liao, Hsin-Hung Lin, Chin-Jung Chen, C. C. Huang
Proceedings Volume 6518, 65184L (2007) https://doi.org/10.1117/12.711933
KEYWORDS: Coating, Semiconducting wafers, Scanning electron microscopy, Inspection, Etching, Photomasks, Temperature metrology, Metrology, Process control, Optical lithography

Proceedings Article | 27 March 2007 Paper
Wen-Shiang Liao, Yu-Huan Liu, Wen-Tung Chang, Tung-Hung Chen, Tommy Shih, Huan-Chiu Tsen, Lee Chung
Proceedings Volume 6520, 65204N (2007) https://doi.org/10.1117/12.714391
KEYWORDS: Photomasks, Composites, Etching, Plasma etching, Scanners, Silicon, Optical lithography, Plasma, 193nm lithography

Showing 5 of 7 publications
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