Dr. Wen-Shiang Liao
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 31 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Electron beam lithography, Photoresist processing, Polymers, Semiconducting wafers, Lithography, Immersion lithography, Water, Surface properties, Surface roughness, Thin film coatings

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Optical alignment, Tin, Photomasks, Copper, Semiconducting wafers, Signal detection, Scanners, Optical lithography, Metals, Logic

Proceedings Article | 21 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Etching, Plasma, Plasma etching, Electrodes, Photomasks, Oxides, Optical lithography, Scanners, Scanning electron microscopy

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Coating, Semiconducting wafers, Scanning electron microscopy, Inspection, Etching, Photomasks, Temperature metrology, Metrology, Process control, Optical lithography

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Photomasks, Composites, Etching, Plasma etching, Scanners, Silicon, Optical lithography, Plasma, 193nm lithography

Showing 5 of 7 publications
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