Dr. Wen-li Wu
NIST Fellow at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (44)

SPIE Journal Paper | 12 August 2013
JM3 Vol. 12 Issue 03
KEYWORDS: Scattering, X-rays, Picosecond phenomena, Lithography, Polymethylmethacrylate, Metrology, 3D metrology, X-ray lithography, Absorption, Directed self assembly

Proceedings Article | 10 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: X-ray optics, Metrology, Silica, Scattering, X-rays, Interfaces, Silicon, Scatterometry, Scatter measurement

Proceedings Article | 10 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Oxides, Metrology, Scattering, Etching, X-rays, Silicon, 3D metrology, Critical dimension metrology, Scatter measurement

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Switches, Deep ultraviolet, Polymers, Diffusion, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist developing

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Data modeling, Scattering, Sensors, X-rays, Dielectrics, Silicon, Laser scattering, Scanning electron microscopy, Transistors, Critical dimension metrology

Showing 5 of 44 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top