Dr. Wenbing Kang
at Merck Japan
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Dry etching, Polymers, Silicon, Electroluminescence, Process control, Absorbance, Semiconducting wafers, 193nm lithography, Bottom antireflective coatings

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Polymers, Molecules, Interfaces, Hydrogen, Diffusion, Coating, Photoresist processing, Polymer thin films, 193nm lithography, Chemically amplified resists

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Antireflective coatings, Reflection, Dry etching, Plasma etching, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Bottom antireflective coatings, Chemically amplified resists

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Optical lithography, Etching, Polymers, Glasses, Copper, Dielectrics, Fourier transforms, Photoresist materials, Aluminum, Semiconducting wafers

PROCEEDINGS ARTICLE | June 23, 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Lithography, Deep ultraviolet, Etching, Polymers, Silicon, Coating, Fourier transforms, Thin film coatings, Semiconducting wafers, Bottom antireflective coatings

PROCEEDINGS ARTICLE | June 11, 1999
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Lithography, Etching, Polymers, Molecules, Silicon, Reflectivity, Photoresist materials, Thin film coatings, Bottom antireflective coatings, Absorption

Showing 5 of 7 publications
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