In this paper, we present a novel laser direct writing system. Compared with conventional laser direct writing system,
there are four key techniques in this system. They are illuminating system, leveling and focusing system, precise position
work-stage system and diffractive focusing system. We introduce and analyze the four systems in this paper respectively.
Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of higher
resolution and lower cost optical lithographic technology. By proper design the structure of the whole system and the
parameters of photon sieve, better resolution can be realized.
A nano-lithographic system based on phase photon sieve is proposed in this paper to overcome the disadvantages of zone
plate array lithographic system and amplitude photon sieve lithographic system. As an important part of the system
performance, the resolution of this system is mainly decided by the diffractive element. The phase photon sieve was used
as the diffractive element in the proposed system. The structure and performance of the phase photon sieve is therefore
very important to the resolution of this system. So, two methods are proposed for the designs and fabrication of the
lithographic system based on phase photon sieve. The feasibility of using this system to realize nano-lithography with a
resolution is of less than 100nm was then discussed. It is shown through analysis that the system not only has higher
resolution and image contrast than the zone plate array lithographic system but also has higher diffractive efficiency than
the amplitude photon sieve lithographic system. As a novel lithographic technique, the phase photon sieve lithographic
system also offers new opportunities for high resolution X-ray microscopy and spectroscopy in physical and life sciences.