Dr. Wenge Yang
at Entegris Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Wafer-level optics, Infrared sensors, Metrology, Sensors, Calibration, Scanners, Error analysis, Integrated optics, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Wafer-level optics, Lithography, Metrology, Scanning electron microscopy, Transmission electron microscopy, Scatterometry, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Lithography, Metrology, Deep ultraviolet, Scanning electron microscopy, Photoresist materials, Scatterometry, Reflectometry, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 8 June 1998
Proc. SPIE. 3332, Metrology, Inspection, and Process Control for Microlithography XII
KEYWORDS: Metrology, Calibration, Etching, Metals, Atomic force microscopy, Scanning electron microscopy, Plasma etching, Critical dimension metrology, Semiconducting wafers, Plasma

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top