Dr. Wenhua Zhu
Postdoc at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 16 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Photomasks, Extreme ultraviolet, Phase shifts, Phase shift keying, Phase imaging, Lens design, Charge-coupled devices, Phase measurement, 3D modeling, Logic

Proceedings Article | 20 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Phase shifts, Zone plates, Photomasks, Extreme ultraviolet, Microscopes, Near field optics, Objectives, Phase measurement, Phase imaging, Phase contrast

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Mirrors, Scanners, Semiconducting wafers, Scanning electron microscopy, Camera shutters, Image processing, Vibration isolation, Projection systems

Proceedings Article | 4 June 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Phase shifts, Photomasks, Extreme ultraviolet, Phase measurement, Interferometry, Phase shifting, Phase interferometry, Diffraction gratings, Reconstruction algorithms, Optical design

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Wavefronts, Diffraction gratings, Interferometry, Shearing interferometers, Optical alignment, Diffraction, Optical design, Sensors, Multiplexing, Monochromatic aberrations

Showing 5 of 13 publications
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