Wendy Li
at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Metrology, Image acquisition, Physics, Control systems, Scanning electron microscopy, Time metrology, Critical dimension metrology, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Metrology, Statistical analysis, Data modeling, Error analysis, Manufacturing, Process control, Critical dimension metrology, Semiconducting wafers, Signal detection, Americium

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