Dr. Wenhui Wang
Lithography Patterning Engineer at Applied Materials
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 26 April 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Sun, Optical proximity correction, High volume manufacturing, Silicon photonics, Current controlled current source

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Wafer-level optics, Lithography, Metrology, Inspection, Optical metrology, Process control, Finite element methods, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Optics manufacturing, Defect inspection

Proceedings Article | 24 March 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Amorphous silicon, Lithography, Optical lithography, Etching, Ions, Chemistry, Extreme ultraviolet, Line edge roughness, Back end of line, Front end of line

Proceedings Article | 18 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Lithography, Metrology, Roads, Scattering, Etching, Inspection, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical lithography, Dielectrophoresis, Line width roughness, Semiconductor manufacturing, Line edge roughness, Chemical mechanical planarization

Showing 5 of 24 publications
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