Dr. Wenjie Li
Advisory Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 23 March 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Lithographic illumination, Etching, Chemical species, Polymers, Resistance, Photoresist materials, Immersion lithography, Fluorine, 193nm lithography

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Data modeling, Etching, Chemical species, Polymers, Oxygen, Photoresist materials, Photomasks, Reactive ion etching, Fluorine, Photoresist developing

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Refractive index, Antireflective coatings, Polymers, Reflectivity, Transmittance, Critical dimension metrology, Fluorine, Semiconducting wafers, Destructive interference, 193nm lithography

Proceedings Article | 4 May 2005 Paper
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Modulation, Etching, Polymers, Photoresist materials, Photomasks, Immersion lithography, Reactive ion etching, Fluorine, 193nm lithography

Proceedings Article | 4 May 2005 Paper
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Polymers, Image processing, Scanners, Particles, Materials processing, Photoresist materials, Immersion lithography, Photoresist processing, Semiconducting wafers

Showing 5 of 15 publications
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