Dr. Wenjin Shao
at ASML San Jose
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 2 April 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Metrology, Data modeling, Calibration, Scanners, Printing, Photomasks, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Model-based design

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Data modeling, Calibration, Image analysis, Time metrology, Optical proximity correction, Vector spaces, Semiconducting wafers, Statistical modeling, Process modeling

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Diffractive optical elements, Cadmium, Data modeling, Birefringence, Scanners, Computational lithography, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Metrology, Diffractive optical elements, Data modeling, Calibration, Scanners, Micromirrors, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Reticles, Optical lithography, Diffractive optical elements, Cadmium, Scanners, Manufacturing, Photomasks, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Showing 5 of 10 publications
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