Wenzhan Zhou
Director at Shanghai Huali Microelectronics Corp
SPIE Involvement:
Publications (25)

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12053, PC120530D (2022) https://doi.org/10.1117/12.2614221
KEYWORDS: Overlay metrology, Double patterning technology, Edge roughness, Scanning electron microscopy, Manufacturing, Line width roughness, Line edge roughness, Integrated circuits, Electron microscopy, Critical dimension metrology

Proceedings Article | 26 May 2022 Poster + Presentation + Paper
Wen Zhan Zhou, Kan Zhou, Yu Yang Bian, Yu Zhang, Ijen van Mil, Robbin Zhu, Jo Zhu, Ivan Mao, Kai yuan Chi, Xuechen Zhu, Kelvin Pao, Pei Wang, Lilla Wang, Abdalmohsen Elmalk, Gary Zhang
Proceedings Volume 12053, 120532A (2022) https://doi.org/10.1117/12.2638430
KEYWORDS: Metrology, Semiconducting wafers, Control systems, Optical proximity correction, Logic devices, Reticles, Stochastic processes, High volume manufacturing, Finite element methods, Error analysis

Proceedings Article | 12 October 2021 Presentation + Paper
Proceedings Volume 11855, 118550E (2021) https://doi.org/10.1117/12.2601674
KEYWORDS: Photomasks, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Feature extraction, Critical dimension metrology, Metrology, OLE for process control, Image quality, Image processing

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11611, 1161113 (2021) https://doi.org/10.1117/12.2591300
KEYWORDS: Process modeling, Semiconductor manufacturing, Control systems, Statistical analysis, Scanning electron microscopy, Process control, Calibration

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11611, 116111Y (2021) https://doi.org/10.1117/12.2584654
KEYWORDS: Overlay metrology, Statistical analysis, Scanning electron microscopy, Metrology, Semiconducting wafers, Error analysis, Critical dimension metrology, Stochastic processes, Shape analysis, Image analysis

Showing 5 of 25 publications
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