Dr. Werner Gillijns
Researcher Optical Lithography at imec
SPIE Involvement:
Author
Publications (28)

Proceedings Article | 26 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Oxides, Lithography, Optical lithography, Metals, Scanners, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11614, Design-Process-Technology Co-optimization XV
KEYWORDS: Lithography, Metals, Extreme ultraviolet, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Scanners, Scanning electron microscopy, Process control, Finite element methods, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Process modeling, OLE for process control

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Lithography, Electron beam lithography, Data modeling, Calibration, Inspection, 3D modeling, Scanning electron microscopy, Time metrology, Optical proximity correction, Semiconducting wafers

Proceedings Article | 20 September 2020 Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Reticles, Etching, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology

Showing 5 of 28 publications
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