Dr. Werner Gillijns
Researcher Optical Lithography at imec
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Phase shifting, Logic, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, SRAF, Nanoimprint lithography

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Nanotechnology, Two photon polymerization, Metals, Adaptive optics, Optical proximity correction, Mask making, Nanofabrication, Electronic design automation, Standards development, Vestigial sideband modulation

Proceedings Article | 21 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Metrology, Optical lithography, Visualization, Metals, Manufacturing, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Optical proximity correction

Proceedings Article | 2 January 2019
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Logic, Image processing, Photomasks, Extreme ultraviolet, Image enhancement, Source mask optimization, SRAF, Tantalum, Resolution enhancement technologies

Proceedings Article | 3 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Reticles, Logic, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Semiconducting wafers

Showing 5 of 21 publications
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