Mr. Wilbert Staring
Business development at TNO
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | September 28, 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Reticles, Optical coherence tomography, Particles, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Optics manufacturing, Contamination control, EUV optics

PROCEEDINGS ARTICLE | October 8, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Electron beam lithography, Reticles, Statistical analysis, Scanners, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Analytical research, Contamination control

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