Dr. Wilhelm Maurer
Director Technology Layout to Mask at Infineon Technologies AG
SPIE Involvement:
Editor | Author
Publications (36)

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Photovoltaics, Databases, Solar cells, Silicon, Design for manufacturing, Optical proximity correction, Model-based design, Process modeling, Resolution enhancement technologies

Proceedings Article | 21 June 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Lithography, Polishing, Design for manufacturing, Photomasks, Cadmium sulfide, Optical proximity correction, SRAF, Mask making, Process modeling, Design for manufacturability

SPIE Journal Paper | 1 July 2005
JM3 Vol. 4 Issue 03
KEYWORDS: Polarization, Immersion lithography, Optical proximity correction, Diffraction, Photomasks, Water, Lithographic illumination, Model-based design, Nanoimprint lithography, Lithography

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Point spread functions, Optical lithography, Data modeling, Databases, Light scattering, Optical proximity correction, SRAF, Convolution, Critical dimension metrology, Process modeling

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Reticles, Logic, Optical lithography, Oscillators, Data modeling, Calibration, Scanners, Photomasks, Optical proximity correction, Semiconducting wafers

Showing 5 of 36 publications
Proceedings Volume Editor (5)

SPIE Conference Volume | 1 October 2013

SPIE Conference Volume | 10 May 2012

SPIE Conference Volume | 13 October 2011

SPIE Conference Volume | 24 September 2010

SPIE Conference Volume | 14 May 2010

Conference Committee Involvement (28)
30th European Mask and Lithography Conference
24 June 2014 | Dresden, Germany
Optical Microlithography XXVII
25 February 2014 | San Jose, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
29th European Mask and Lithography Conference
25 May 2013 | Dresden, Germany
Optical Microlithography XXVI
26 February 2013 | San Jose, California, United States
Showing 5 of 28 Conference Committees
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