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Wilhelm Tsai
Project Manager at Micron Technology Taiwan Inc
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Publications (1)
Proceedings Article | 2 April 2014 Paper
Integrated ADI optical metrology solution for lithography process control of CD and OV
Marlene Strobl, Wilhelm Tsai, Andy Lan, Tom Chen, Wilson Hsu, Henry Chen, Frida Liang, Alan Wang, Platt Hung, David Huang, Ethan Chiu, Paul Yu, Yi Song, Sylvia Yuan, Remco Dirks, Noelle Wright, Mariya Ponomarenko, Hugo Cramer, Baukje Wisse, Vincent Couraudon, Bijoy Rajasekharan, Reinder Plug, Stefan Kruijswijk, Henk Niesing
Proceedings Volume 9050, 90501J (2014) https://doi.org/10.1117/12.2047205
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Metrology, Overlay metrology, Lithography, Process control, Scanners, Time metrology, Lithium, Optical metrology
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