William H. Arnold
Deceased
SPIE Involvement:
Financial Advisory Committee | Author | Visiting Lecturer | Science Fair Judge
Profile Summary

William H. Arnold
Chief Scientist, and Vice President of Technology Development Center, ASML.

Education
MS in Physics, University of Chicago
BA in Physics, Hampshire College

Technical Activities/Interests
• Optical and EUV lithography; semiconductor devices and chip manufacturing; nanoscale processing for future electronic and photonics devices

Service to the Technical Community
• Micro and Nanoengineering (MNE) Organizing Committee, 1998-2010
• International Society of Semiconductor Manufacturers (ISSM) Organizing Committee, 2006-2010
• 193 nm Symposium Organizing Committee, 1995-1998
• 157 nm Symposium Organizing Committee, 1999-2002
• Next Generation Lithography Working Group, 1997-2001
• VLSI Symposium Program Committee, 1998-2000
• SIA Lithography Technical Working Group Co-Chairman 1996-97
• Technical Advisory Board (TAB); Sematech, to define US lithography roadmap, 1988-97; Sematech Lithography Focus TAB Chairman 1992-93
• Member IEEE (since 1992); Member OSA (since 1996)
• Author of >100 technical papers, book chapters, and short courses on microlithography and metrology for semiconductor devices
• Many book and paper reviews
• Numerous invited talks and panels (IEDM, VLSI, VLSI-TSA, ESSDRC)

Services to SPIE
• Member of SPIE (since 1983)
• Member of SPIE Board of Directors, 2004-2007
• Senior Editor, Microlithography, Journal of Micro/Nanolithography, MEMs, and MOEMs (JM3), 2002-2010
• Advisory Committee Advanced Lithography Symposium - 1988-2010
• Chairman, Publications Committee, 2004-2008
• Publications Committee 2001-2009
• Symposium Committee 1996-1998, 2004-2007
• Frits Zernike Microlithography Award Committee 2002-2004
• Microlithography Symposium – Chairman 1994-95, Vice Chairman 1992-93
• Integrated Circuit Metrology, Inspection, and Process Control – Chairman 1990-1991, Vice Chairman 1988-1989, Conference Committee 1986-1993
• Editor, Integrated Circuit Metrology, Inspection, and Process Control IV, Proc
Publications (21)

Proceedings Article | 10 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Metrology, Scanners, Scatterometry, Time metrology, Process control, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Logic, Scanners, Silicon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Logic devices, Overlay metrology, Plasma

SPIE Journal Paper | 1 January 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Lithography, Double patterning technology, Optical lithography, Photoresist processing, Etching, Photomasks, Manufacturing, Overlay metrology, Critical dimension metrology, Semiconductors

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Reticles, Optical lithography, Etching, Scanners, Process control, Extreme ultraviolet, Double patterning technology, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 11 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Reticles, Optical lithography, Etching, Scanners, Photomasks, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Showing 5 of 21 publications
Proceedings Volume Editor (2)

Conference Committee Involvement (12)
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
SPIE Advanced Lithography
12 February 2012 | San Jose, United States
SPIE Advanced Lithography
27 February 2011 | San Jose, United States
SPIE Advanced Lithography
22 February 2009 | San Jose, United States
Showing 5 of 12 Conference Committees
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top