Dr. William K. Bell Profile

Dr. William K. Bell

at Seagate Technology

SPIE Involvement:

Author

Publications (6)

SPIE Journal Paper | 26 July 2016

High aspect ratio patterning of photosensitive polyimide with low thermal expansion coefficient and low dielectric constant

Andrew Dick, William Bell, Brendan Luke, Erin Maines, Brennen Mueller, Brandon Rawlings, Paul Kohl, C. Grant Willson

JM3, Vol. 15, Issue 03, 033503, (July 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.033503

KEYWORDS: Dielectrics, Optical lithography, Polymers, Semiconducting wafers, Ultraviolet radiation, Silicon, Solids, Thin films, Sodium, Near ultraviolet

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Proceedings Article | 20 March 2015 Paper

Directly patternable dielectric based on fluorinated polyimide

Andrew Dick, William Bell, Brendan Luke, Erin Maines, Brennan Mueller, Paul Kohl, Brandon Rawlings, C. Grant Willson

Proceedings Volume 9425, 94251D (2015) https://doi.org/10.1117/12.2085793

KEYWORDS: Dielectrics, Optical lithography, Polymers, Silicon, Semiconducting wafers, Near ultraviolet, Absorbance, Silicon films, Packaging, Ultraviolet radiation

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SPIE Journal Paper | 16 July 2014 Open Access

Planarizing material for reverse-tone step and flash imprint lithography

Tsuyoshi Ogawa, B. Michael Jacobsson, Ryan Deschner, William Bell, Michael Lin, Yuji Hagiwara, Satoshi Takei, Makoto Hanabata, C. Grant Willson

JM3, Vol. 13, Issue 03, 031302, (July 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.031302

KEYWORDS: Etching, Ultraviolet radiation, Lithography, Silicon, Scanning electron microscopy, Industrial chemicals, Coating, Liquids, Plasma etching, Epoxies

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SPIE Journal Paper | 24 September 2013 Open Access

Reactive fluorinated surfactant for step and flash imprint lithography

Tsuyoshi Ogawa, Daniel Hellebusch, Michael Lin, B. Michael Jacobsson, William Bell, C. Grant Willson

JM3, Vol. 12, Issue 03, 031114, (September 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.031114

KEYWORDS: Lithography, Head-mounted displays, Glasses, Optical lithography, Microfluidics, Nanoimprint lithography, Interfaces, Natural surfaces, Chemistry, Failure analysis

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Proceedings Article | 4 April 2011 Paper

Reactive fluorinated surfactant for step and flash imprint lithography

Tsuyoshi Ogawa, Daniel Hellebusch, Michael Lin, B. Michael Jacobsson, William Bell, C. Grant Willson

Proceedings Volume 7970, 79700T (2011) https://doi.org/10.1117/12.871627

KEYWORDS: Fluorine, Silicon, Lithography, Head-mounted displays, Glasses, Optical lithography, Nanoimprint lithography, Interfaces, Information operations, Adhesives

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Proceedings Article | 3 April 2010 Paper

Planarizing material for reverse-tone step and flash imprint lithography

Tsuyoshi Ogawa, Satoshi Takei, B. Michael Jacobsson, Ryan Deschner, William Bell, Michael Lin, Yuji Hagiwara, Makoto Hanabata, C. Grant Willson

Proceedings Volume 7637, 763708 (2010) https://doi.org/10.1117/12.846430

KEYWORDS: Silicon, Ultraviolet radiation, Etching, Oxygen, Silicon carbide, Lithography, Scanning electron microscopy, Coating, Liquids, Epoxies

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Showing 5 of 6 publications

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