William H. Broadbent
Sr Manager/Reticle Inspection Product Marketing at KLA Corp
SPIE Involvement:
Publications (22)

Proceedings Article | 22 January 2018 Paper
William Broadbent, Sterling Watson, Pei-Chun Chiang, Rui-Fang Shi, Jim-Ren Wang, Phillip Lim
Proceedings Volume 10451, 104510M (2018) https://doi.org/10.1117/12.2281354
KEYWORDS: Inspection, Reticles, Extreme ultraviolet, Defect detection, Semiconducting wafers, Particles, Data modeling, Photomasks, Databases, Extreme ultraviolet lithography

Proceedings Article | 13 July 2017 Paper
Jongju Park, Jongin Moon, Suein Son, Donghoon Chung, Byung-Gook Kim, Chan-Uk Jeon, Patrick LoPresti, Shan Xue, Sonny Wang, Bill Broadbent, Soonho Kim, Jiuk Hur, Min Choo
Proceedings Volume 10454, 104540J (2017) https://doi.org/10.1117/12.2282406
KEYWORDS: Databases, Photomasks, Lithography, Inspection, Data processing

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 97761H (2016) https://doi.org/10.1117/12.2218454
KEYWORDS: Inspection, Pellicles, Extreme ultraviolet, Photomasks, Defect inspection, Reticles, Semiconducting wafers, Modulation, Defect detection, Image analysis

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 963511 (2015) https://doi.org/10.1117/12.2197729
KEYWORDS: Inspection, Photomasks, Reticles, Defect detection, Semiconducting wafers, Optical proximity correction, Databases, Lithography, SRAF, Printing

Proceedings Article | 23 September 2013 Paper
Proceedings Volume 8880, 88800E (2013) https://doi.org/10.1117/12.2027307
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Reticles, Optical proximity correction, SRAF, Defect detection, Lithography, Critical dimension metrology, Opacity

Showing 5 of 22 publications
Conference Committee Involvement (8)
Photomask Technology 2014
16 September 2014 | Monterey, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Photomask Technology
11 September 2012 | Monterey, California, United States
Photomask Technology
19 September 2011 | Monterey, California, United States
Photomask Technology
13 September 2010 | Monterey, California, United States
Showing 5 of 8 Conference Committees
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