William H. Broadbent
Sr Manager/Reticle Inspection Product Marketing at KLA Corp
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 22 January 2018 Paper
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Reticles, Defect detection, Data modeling, Databases, Particles, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 13 July 2017 Paper
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Databases, Inspection, Data processing, Photomasks

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reticles, Defect detection, Modulation, Inspection, Image analysis, Pellicles, Photomasks, Extreme ultraviolet, Semiconducting wafers, Defect inspection

Proceedings Article | 23 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Defect detection, Databases, Inspection, Printing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 23 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Reticles, Defect detection, Opacity, Inspection, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers

Showing 5 of 22 publications
Conference Committee Involvement (8)
Photomask Technology 2014
16 September 2014 | Monterey, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Photomask Technology
11 September 2012 | Monterey, California, United States
Photomask Technology
19 September 2011 | Monterey, California, United States
Photomask Technology
13 September 2010 | Monterey, California, United States
Showing 5 of 8 Conference Committees
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