William Brunsvold
at Ciba Corp
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Etching, Polymers, Silicon, Manufacturing, Resistance, Photomasks, Absorbance, Reactive ion etching, 193nm lithography

Proceedings Article | 24 August 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, Monochromatic aberrations, Transparency, Imaging systems, Etching, Polymers, Chemistry, Resistance, Surface roughness, Polymerization

Proceedings Article | 24 August 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Contamination, Polymers, Scanners, Manufacturing, Laser induced plasma spectroscopy, Printing, Microelectronics, Photomasks, Semiconducting wafers, Floods

Proceedings Article | 23 June 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Lithography, Deep ultraviolet, Etching, Polymers, Surface roughness, Photoresist materials, Photomasks, Reactive ion etching, 193nm lithography, Phase shifts

Proceedings Article | 11 June 1999
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Signal to noise ratio, Lithography, Reticles, Deep ultraviolet, Polymers, Manufacturing, Photoresist materials, Bridges, Temperature metrology, Phase shifts

Showing 5 of 18 publications
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