Dr. William Chu
Lithography Manager at IBM Microelectronics Div
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Optical lithography, Imaging systems, Manufacturing, Scanning electron microscopy, Photomasks, Semiconducting wafers, Overlay metrology, Imaging metrology

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Logic, Scanning electron microscopy, Transmission electron microscopy, Printing, Line width roughness, Transistors, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 21 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Optical lithography, Etching, Scanners, Error analysis, Photomasks, Optical proximity correction, Critical dimension metrology, Reactive ion etching, Semiconducting wafers

Proceedings Article | 14 March 2006 Paper
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Reticles, Cadmium, Etching, Control systems, Photomasks, Immersion lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 30 July 2002 Paper
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Lithography, Logic, Lithographic illumination, Manufacturing, Printing, Image enhancement, Optical proximity correction, SRAF, Binary data, Model-based design

Showing 5 of 8 publications
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