William DeVore
Engineer
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Optical lithography, Photomasks, Optical proximity correction, Raster graphics, Photoresist processing, Model-based design, Edge roughness

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