Dr. William D. Hinsberg
Owner at Columbia Hill Technical Consulting
SPIE Involvement:
Conference Program Committee | Conference Chair | Author | Editor
Publications (56)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Photons, Molecules, Electrons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Oxides, Lithography, Imaging systems, Polymers, Metals, Photons, Extreme ultraviolet, Extreme ultraviolet lithography, Systems modeling, Absorption

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Lithium, Polymers, Image processing, Ions, Reflectivity, Photoresist processing, Semiconducting wafers, Standards development, Image quality standards

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Glasses, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Line edge roughness, Analog electronics, Photomicroscopy, Photoresist processing, Semiconducting wafers, Resist chemistry

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Thin films, Lithography, Electron beam lithography, Magnesium, Polymers, Glasses, Molecules, Silicon, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Visualization, Polymers, Video, Luminescence, Interfaces, Optical tracking, Video processing, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Showing 5 of 56 publications
Conference Committee Involvement (3)
Alternative Lithographic Technologies III
1 March 2011 | San Jose, California, United States
Alternative Lithographic Technologies II
23 February 2010 | San Jose, California, United States
Advances in Resist Technology and Processing X
1 March 1993 | San Jose, CA, United States
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