Dr. William B. Howard
Research Scientist at KLA Texas
SPIE Involvement:
Publications (16)

Proceedings Article | 3 May 2007 Paper
Proceedings Volume 6533, 65330A (2007) https://doi.org/10.1117/12.736495
KEYWORDS: Reticles, Inspection, Photomasks, Lithography, Critical dimension metrology, Manufacturing, Systems modeling, Semiconducting wafers, Binary data, Metrology

Proceedings Article | 27 March 2007 Paper
Mark Smith, Joseph Bendik, Ivan Lalovic, Nigel Farrar, William Howard, Chris Sallee
Proceedings Volume 6520, 65203E (2007) https://doi.org/10.1117/12.714102
KEYWORDS: Lithography, Excimers, Chromatic aberrations, Excimer lasers, Optical simulations, Data modeling, 193nm lithography, Photomasks, Electroluminescence, Performance modeling

Proceedings Article | 16 June 2005 Paper
Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637289
KEYWORDS: Reticles, Inspection, Metrology, Lithography, Computer simulations, Semiconducting wafers, Photomasks, Manufacturing, Calibration, Solids

Proceedings Article | 5 May 2005 Paper
William Howard, Jaione Tirapu Azpiroz, Yalin Xiong, Chris Mack, Gaurav Verma, William Volk, Harold Lehon, Yunfei Deng, Rui-fang Shi, James Culp, Scott Mansfield
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.604698
KEYWORDS: Inspection, Semiconducting wafers, Reticles, Design for manufacturing, Scanning electron microscopy, Optical proximity correction, Lithography, Resolution enhancement technologies, Calibration, Defect detection

Proceedings Article | 17 December 2003 Paper
Anthony Nhiev, Jason Hickethier, Haiqing Zhou, Trent Hutchinson, William Howard, Mohsen Ahmadian
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518048
KEYWORDS: Inspection, Scanning electron microscopy, Photomasks, Semiconducting wafers, Deep ultraviolet, Reticles, Lithography, Opacity, Critical dimension metrology, Printing

Showing 5 of 16 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top