William J. Huang
Applications Engineer at KLA Corp
SPIE Involvement:
Publications (4)

Proceedings Article | 29 September 2010 Paper
Ching-Fang Yu, Mei-Chun Lin, Mei-Tsu Lai, Luke T.H. Hsu, Angus Chin, S. C. Lee, Anthony Yen, Jim Wang, Ellison Chen, David Wu, William Broadbent, William Huang, Zinggang Zhu
Proceedings Volume 7823, 78232F (2010) https://doi.org/10.1117/12.865604
KEYWORDS: Reticles, Inspection, SRAF, Semiconducting wafers, Computational lithography, Control systems, Defect detection, Databases, Model-based design, Optical proximity correction

Proceedings Article | 23 September 2009 Paper
Proceedings Volume 7488, 74882Q (2009) https://doi.org/10.1117/12.830139
KEYWORDS: Inspection, Photomasks, SRAF, Lithography, Defect detection, Reticles, Semiconducting wafers, Image resolution, Image processing, Wafer inspection

Proceedings Article | 11 May 2009 Paper
Won-Sun Kim, Dong-Hoon Chung, Chan-Uk Jeon, HanKu Cho, William Huang, John Miller, Gregg Inderhees, Becky Pinto, Jiuk Hur, Kihun Park, Jay Han
Proceedings Volume 7379, 73791C (2009) https://doi.org/10.1117/12.824289
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Wafer inspection, Reticles, SRAF, Optical proximity correction, Lithography, Contamination, Image resolution

Proceedings Article | 30 October 2007 Paper
David Kim, Venu Vellanki, William Huang, Andrew Cao, Chunlin Chen, Aditya Dayal, Paul Yu, Ki Hun Park, Yumiko Maenaka, Kazuko Jochi, Gregg Inderhees
Proceedings Volume 6730, 67305M (2007) https://doi.org/10.1117/12.747163
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Cameras, Deep ultraviolet, Lithography, Etching, Reticles, Fiber optic illuminators

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