William P. Lipscomb
Project Engineer at SEMATECH Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Metrology, Etching, Pattern recognition, Scanning electron microscopy, Double patterning technology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 23 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Optical microscopes, Polarization, Calibration, Microscopy, Silicon, Reflectivity, Optical testing, Scatterometry, Optical aberrations, Overlay metrology

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Etching, Inspection, Process control, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Yield improvement, Overlay metrology

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Microscopes, Polarization, Cameras, Microscopy, Silicon, Reflectivity, Objectives, Overlay metrology, Dielectric polarization, Fiber optic illuminators

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Reticles, Metrology, Pattern recognition, Scanning electron microscopy, Scatterometry, Precision measurement, Optical proximity correction, Computer aided design, Semiconducting wafers

Showing 5 of 8 publications
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