William R. Roberts
Principle Engineer
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 16 April 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Etching, Image processing, Manufacturing, Scanning electron microscopy, Image quality, Process control, Optical alignment, Critical dimension metrology, Iterated function systems

Proceedings Article | 20 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Diffraction, Reticles, Metrology, Calibration, Quartz, Scanners, Semiconducting wafers, Overlay metrology, Phase shifts, Diffraction gratings

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Metrology, Interferometers, Wavefronts, Projection systems, Semiconducting wafers, Phase shifts, Diffraction gratings

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Optical lithography, Data modeling, Manufacturing, Process control, Optical alignment, Semiconducting wafers, Tolerancing, Performance modeling, Overlay metrology

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Scanners, Manufacturing, Distortion, Lens design, Semiconductor manufacturing, Optical alignment, Critical dimension metrology, Overlay metrology, Front end of line

Showing 5 of 17 publications
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