Dr. William P. Rodrigues
at Applied Materials Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 5 September 2001
Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII
KEYWORDS: Lithography, Deep ultraviolet, Diffusion, Coating, Manufacturing, Photoresist materials, Process control, Photomasks, Critical dimension metrology, Photoresist processing

Proceedings Article | 24 August 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, Deep ultraviolet, Etching, Coating, Chemistry, Manufacturing, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers

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