William A. Stanton
Sr. R&D Manager
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Neck, Lithography, Photovoltaics, Calibration, Lens design, Photomasks, Directed self assembly, Source mask optimization, Performance modeling, Process modeling

Proceedings Article | 18 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Reticles, Metrology, Data modeling, Manufacturing, Feature extraction, Scanning electron microscopy, Dysprosium, Optical proximity correction, Semiconducting wafers, Data analysis

Proceedings Article | 5 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Manufacturing, Scanning electron microscopy, Photomasks, Optical proximity correction, Computer aided design, Critical dimension metrology, Semiconducting wafers, Electronic design automation

Proceedings Article | 15 March 2012
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Lithography, Atrial fibrillation, Manufacturing, Computing systems, Source mask optimization, Computational lithography, Optical proximity correction, Optimization (mathematics), Process engineering, Resolution enhancement technologies

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Image processing, Manufacturing, Electroluminescence, Photomasks, Cadmium sulfide, Source mask optimization, Optical proximity correction, Optimization (mathematics), Semiconducting wafers

Showing 5 of 7 publications
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