Prof. Wim M. J. Coene
Director Research at ASML Netherlands BV
SPIE Involvement:
Conference Program Committee | Author
Publications (8)

Proceedings Article | 26 June 2017
Proc. SPIE. 10335, Digital Optical Technologies 2017
KEYWORDS: Coherence imaging, Visible radiation, Computational imaging, Spatial light modulators, Phase retrieval, Far-field diffraction, Reconstruction algorithms, X-ray imaging

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Actuators, Mirrors, Wavefronts, Adaptive optics, Deformable mirrors, Distortion, Thermal effects, Projection systems, Extreme ultraviolet lithography, Optical aberrations, Electroluminescent displays, Thermal modeling

Proceedings Article | 3 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Semiconductors, Metrology, Data modeling, Sensors, Silicon, Wavefronts, Scatterometry, Collimation, Charge-coupled devices, Diffraction gratings

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Carbon, Lithography, Refractive index, Birefringence, Scatterometry, Finite element methods, Critical dimension metrology, Semiconducting wafers, Absorption, Anisotropy

Proceedings Article | 22 June 2006
Proc. SPIE. 6282, Optical Data Storage 2006
KEYWORDS: Signal to noise ratio, Sensors, Error analysis, Interference (communication), Receivers, Computer programming, Near field, Double patterning technology, Optical recording, Error control coding

Proceedings Article | 9 September 2004
Proc. SPIE. 5380, Optical Data Storage 2004
KEYWORDS: Sensors, Receivers, Distortion, Signal processing, Compact discs, Electronic filtering, Digital video discs, Optical storage, Signal detection, Near field optics

Showing 5 of 8 publications
Conference Committee Involvement (3)
Optical Measurement Systems for Industrial Inspection X
26 June 2017 | Munich, Germany
Optical Measurement Systems for Industrial Inspection IX
22 June 2015 | Munich, Germany
Optical Measurement Systems for Industrial Inspection VIII
13 May 2013 | Munich, Germany
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