Wim Schollaert
Application Engineer at JSR Micro NV
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Optical lithography, Molecular bridges, Polymers, Metals, Particles, Photoresist materials, Bridges, Line width roughness, Standards development

Proceedings Article | 30 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Particles, Composites, Coating, Chemistry, Manufacturing, Digital watermarking, Immersion lithography, Manufacturing equipment, Photoresist processing, Semiconducting wafers

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