Mr. Winfried Kaiser
Senior Vice President Product Strategy at Carl Zeiss SMT GmbH
SPIE Involvement:
Fellow status | Conference Program Committee | Conference Chair | Author | Editor
Publications (20)

SPIE Journal Paper | October 30, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Mirrors, Nanoimprint lithography, Projection systems, Wafer-level optics

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Mirrors, Optical design, Reticles, Imaging systems, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Modeling, Lithography, Sensors, Scanners, Manufacturing, Reflectivity, Lens design, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Wafer-level optics, Lithography, Reticles, Imaging systems, Scanners, Ions, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | November 16, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Wafer-level optics, Lithography, Reticles, Imaging systems, Scanners, Ions, Image resolution, Photomasks, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Neodymium, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Lithography, Mirrors, Reticles, Lithographic illumination, Projection systems, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Showing 5 of 20 publications
Conference Committee Involvement (3)
International Conference on Extreme Ultraviolet Lithography 2018
17 September 2018 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography
11 September 2017 | Monterey, California, United States
Soft X-Ray and EUV Imaging Systems
3 August 2000 | San Diego, CA, United States
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top