Winfried M. Kaiser
Senior Vice President / Carl Zeiss Fellow at Carl Zeiss SMT GmbH
SPIE Involvement:
Fellow status | Conference Program Committee | Conference Chair | Author
Publications (22)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Polarization, Sensors, Scanners, Lens design, Extreme ultraviolet lithography, High volume manufacturing, Polarization control

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Modeling, Lithography, Imaging systems, Sensors, Scanners, Manufacturing, Lens design, Photomasks, Extreme ultraviolet lithography, Optical proximity correction

SPIE Journal Paper | October 30, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Mirrors, Nanoimprint lithography, Projection systems, Wafer-level optics

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Mirrors, Optical design, Reticles, Imaging systems, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Modeling, Lithography, Sensors, Scanners, Manufacturing, Reflectivity, Lens design, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Wafer-level optics, Lithography, Reticles, Imaging systems, Scanners, Ions, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Neodymium, Semiconducting wafers

Showing 5 of 22 publications
Conference Committee Involvement (4)
International Conference on Extreme Ultraviolet Lithography 2019
15 September 2019 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2018
17 September 2018 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography
11 September 2017 | Monterey, California, United States
Soft X-Ray and EUV Imaging Systems
3 August 2000 | San Diego, CA, United States
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top