Dr. Winfried M. Kaiser
Senior Vice President / Carl Zeiss Fellow at Carl Zeiss SMT GmbH
SPIE Involvement:
Conference Program Committee | Author
Publications (28)

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Scanners, Particles, Photoresist materials, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Optics manufacturing, Stochastic processes

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Mirrors, Metrology, Lithographic illumination, Projection systems, Light sources and illumination, Extreme ultraviolet, Extreme ultraviolet lithography, Optics manufacturing, EUV optics

Proceedings Article | 16 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Mirrors, Optical design, Lithographic illumination, Imaging systems, Scanners, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, EUV optics

Proceedings Article | 16 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Thermography, Sensors, Scanners, Lens design, Pellicles, Photomasks, Extreme ultraviolet lithography, High volume manufacturing

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Lithography, Mirrors, Metrology, Imaging systems, Scanners, Control systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 28 publications
Conference Committee Involvement (5)
International Conference on Extreme Ultraviolet Lithography 2020
20 September 2020 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2019
16 September 2019 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2018
17 September 2018 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography
11 September 2017 | Monterey, California, United States
Soft X-Ray and EUV Imaging Systems
3 August 2000 | San Diego, CA, United States
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