Winfried W. Meier
Senior Member Technical Staff
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 2 May 2008 Paper
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Lithography, Sensors, Photomasks, Double patterning technology, Optical alignment, Critical dimension metrology, Neodymium, Semiconducting wafers, Binary data, Resolution enhancement technologies

Proceedings Article | 11 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Superposition, Lithography, Lithographic illumination, Ultraviolet radiation, Photomasks, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Binary data, Stereolithography

Proceedings Article | 20 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Monochromatic aberrations, Data modeling, Scanners, Wavefronts, Wavefront aberrations, Distortion, Scanning electron microscopy, Critical dimension metrology, Optimization (mathematics), Tolerancing

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Logic, Optical lithography, Scanners, Manufacturing, Objectives, Finite element methods, Optical engineering, Semiconducting wafers, Yield improvement, Standards development

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Digital signal processing, Polarization, Imaging systems, Metals, Scanning electron microscopy, Photomasks, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 8 publications
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