Dr. Wolfgang Demmerle
Marketing Manager at Synopsys GmbH
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 4 April 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Photomasks, Extreme ultraviolet, Lithography, Computational lithography, 3D modeling, Computer simulations, Optical proximity correction, Performance modeling, Photoresist processing, Resolution enhancement technologies

Proceedings Article | 6 September 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Metals, Directed self assembly, Critical dimension metrology, Calibration, Error analysis, Etching, Computer simulations, Process modeling, Optical lithography, Extreme ultraviolet lithography

Proceedings Article | 27 April 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: 3D modeling, Calibration, Data modeling, Optical lithography, Nanotechnology, Very large scale integration, System on a chip, Logic, Research facilities

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Chemically amplified resists, Photoresist processing, Lithography, Process modeling, Polymers, 3D modeling, Data modeling, Particles, Diffusion

Proceedings Article | 22 March 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Calibration, Data modeling, 3D modeling, Computational lithography, Lithography, Optimization (mathematics), Directed self assembly, Optical lithography, Metals, Photomasks, Scanning electron microscopy, Statistical analysis, Picosecond phenomena, Interfaces

Showing 5 of 20 publications
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