Dr. Wolfgang Dettmann
at Infineon Technologies AG
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Metals, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 2 June 2004
Proc. SPIE. 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Optical lithography, Etching, Quartz, Scanners, Manufacturing, Photomasks, Mask making, Critical dimension metrology, Overlay metrology, Phase shifts

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Lithography, Defect detection, Detection and tracking algorithms, Quartz, Inspection, Photomasks, Algorithm development, Semiconducting wafers, Phase shifts, Defect inspection

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Phase shifting, Imaging systems, Sensors, Image processing, Fourier transforms, Image resolution, Image analysis, Scanning electron microscopy, Photomasks, Raster graphics

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Quartz, Inspection, Scanning electron microscopy, Printing, Bridges, Photomasks, Semiconducting wafers, Phase shifts, Defect inspection

Showing 5 of 12 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top