Dr. Wolfgang Emer
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Optical lithography, Polarization, Imaging systems, Control systems, Printing, Immersion lithography, Critical dimension metrology, Thin film coatings, Semiconducting wafers

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Lithography, Monochromatic aberrations, Imaging systems, Manufacturing, Scanning electron microscopy, Image sensors, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

Proceedings Article | 17 August 1999
Proc. SPIE. 3745, Interferometry '99: Applications

Proceedings Article | 30 June 1998
Proc. SPIE. 3478, Laser Interferometry IX: Techniques and Analysis
KEYWORDS: Mirrors, Beam splitters, Light sources, Imaging systems, Interferometers, Sensors, Interferometry, Objectives, Excimer lasers, Vacuum ultraviolet

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