Wolfgang Hoppe
at Synopsys GmbH
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Calibration, Manufacturing, Computer simulations, 3D modeling, Photomasks, Source mask optimization, Optical proximity correction, Photoresist processing

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Image processing, Photomasks, Extreme ultraviolet lithography, Double patterning technology, Optical proximity correction

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Data modeling, 3D modeling, Scanning electron microscopy, Source mask optimization, Computational lithography, Optical proximity correction, Optimization (mathematics), Photoresist processing

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Data modeling, Calibration, Etching, 3D modeling, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Statistical modeling, 3D image processing

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Electron beam lithography, Data modeling, Scattering, Calibration, Computer simulations, Scanning electron microscopy, Monte Carlo methods, Photoresist processing, Process modeling, Chemically amplified resists

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Point spread functions, Cadmium, Data modeling, Error analysis, 3D modeling, Critical dimension metrology, Geometrical optics, Virtual reality, Electron beam direct write lithography, Model-based design

Showing 5 of 12 publications
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