Dr. Wolfram Koestler
at Qimonda Dresden GmbH & Co OHG
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Code division multiplexing, Lithography, Metrology, Statistical analysis, Etching, Scanning electron microscopy, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Metals, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Semiconductors, Lithography, Reticles, Optical lithography, Tungsten, Manufacturing, Process control, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 18 August 2000
Proc. SPIE. 4181, Challenges in Process Integration and Device Technology
KEYWORDS: Semiconductors, Lithography, Deep ultraviolet, Scanners, Manufacturing, Photoresist materials, Thin film coatings, Semiconducting wafers, Photoresist developing

Proceedings Article | 5 July 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Semiconductors, Lithography, Contamination, Deep ultraviolet, Scanners, Particles, Manufacturing, Data processing, Critical dimension metrology, Semiconducting wafers

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