Mr. Won-Il Lee Profile

Won-Il Lee

Graduate student at Stony Brook Univ

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Author

Publications (6)

Proceedings Article | 9 April 2024 Presentation + Paper

Understanding the stability of advanced inorganic-organic hybrid thin films for advanced resist applications

Dan Le, Thi Thu Huong Chu, Jin-Hyun Kim, Jean-Francois Veyan, Won-Il Lee, Nikhil Tiwale, Minjong Lee, Seungsoo Choi, Jihoon Woo, Chang-Yong Nam, Rino Choi, Jiyoung Kim

Proceedings Volume 12957, 129570B (2024) https://doi.org/10.1117/12.3010970

KEYWORDS: Thin films, Film thickness, X-ray photoelectron spectroscopy, Atomic layer deposition, Chemical analysis, Aluminum, Carbon monoxide, Materials science, Extreme ultraviolet lithography, Engineering

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Proceedings Article | 30 April 2023 Presentation

Atomic layer deposition derived organic-inorganic hybrid EUV photoresists

Ashwanth Subramanian, Dan Le, Su Min Hwang, Nikhil Tiwale, Won-Il Lee, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume 12498, 1249810 (2023) https://doi.org/10.1117/12.2658685

KEYWORDS: High volume manufacturing, Extreme ultraviolet lithography, Atomic layer deposition, Photoresist materials, Electron beam lithography, Thin films, Silicon, Resistance, Polymethylmethacrylate, Photoresist processing

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Proceedings Article | 30 April 2023 Presentation

Hybrid positive-tone resist synthesis via vapor phase infiltration for contact-hole patterning

Nikhil Tiwale, Ashwanth Subramanian, Won-Il Lee, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume 12498, 124981A (2023) https://doi.org/10.1117/12.2658659

KEYWORDS: Optical lithography, Oxides, Metals, Polymer thin films, Nanolithography, Nanocomposites, Materials processing, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet

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Proceedings Article | 1 December 2022 Presentation + Paper

Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)

Dan Le, Su Min Hwang, Jihoon Woo, Seungsoo Choi, Taehee Park, Jean-Francois Veyan, Nikhil Tiwale, Ashwanth Subramanian, Won-Il Lee, Chang-Yong Nam, Rino Choi, Jiyoung Kim

Proceedings Volume 12292, 1229205 (2022) https://doi.org/10.1117/12.2641647

KEYWORDS: Thin films, Extreme ultraviolet lithography, Electron beam lithography, FT-IR spectroscopy, Photoresist materials, Chemical reactions, Floods, Atomic layer deposition, Chemical analysis, Thin film deposition

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Proceedings Article | 11 November 2022 Presentation

EUVL characteristics of indium-oxide-infiltrated PMMA hybrid photoresist synthesized by vapor-phase infiltration

Ashwanth Subramanian, Nikhil Tiwale, Won-Il Lee, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume PC12292, PC122920L (2022) https://doi.org/10.1117/12.2643226

KEYWORDS: Extreme ultraviolet lithography, Polymethylmethacrylate, Photoresist materials, Silicon, Resistance, Indium oxide, Etching, Electron beam lithography, Dry etching, Plasma

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Proceedings Article | 11 November 2022 Presentation

Low-energy electron exposure and reactive ion etching characteristics of hybrid EUV photoresist synthesized by molecular atomic layer deposition

Won-Il Lee, Ashwanth Subramanian, Nikhil Tiwale, Dan Le, Su Min Hwang, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume PC12292, PC122920K (2022) https://doi.org/10.1117/12.2641794

KEYWORDS: Extreme ultraviolet lithography, Reactive ion etching, Photoresist materials, Atomic layer deposition, Electron beam lithography, Thin films, Photoresist developing, Etching, Semiconductors, Photons

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Showing 5 of 6 publications

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