Won-Kwang Ma
at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 26 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Optical lithography, Etching, Scanners, Materials processing, Bridges, Photomasks, Line width roughness, Immersion lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Reticles, Data modeling, Etching, Photomasks, Extreme ultraviolet, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 12 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Signal processing, Thermal effects, Process control, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology, Resolution enhancement technologies, Chemical mechanical planarization

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Calibration, Scanners, Materials processing, Photomasks, Immersion lithography, Optical alignment, Thin film coatings, Semiconducting wafers, Overlay metrology, Protactinium

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Diffraction, Refractive index, Contamination, Lithographic illumination, Reliability, Scanning electron microscopy, Immersion lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Wafer-level optics, Neck, Lithography, Scanners, Transistors, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Optical calibration, Fiber optic illuminators

Showing 5 of 10 publications
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