Won Sun Kim
Research Staff Member at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Reticles, Defect detection, Image processing, Inspection, Image resolution, Wafer inspection, Photomasks, SRAF, Semiconducting wafers

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Reticles, Defect detection, Inspection, Image resolution, Photomasks, Artificial intelligence, Optical proximity correction, SRAF, Semiconducting wafers, Model-based design

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Reticles, Contamination, Inspection, Image resolution, Wafer inspection, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 23 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Reticles, Radon, Defect detection, Inspection, Photomasks, Double patterning technology, Ear, Critical dimension metrology, Semiconducting wafers, Defect inspection

Proceedings Article | 14 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Defect detection, Deep ultraviolet, Particles, Manufacturing, Lamps, Inspection, Photomasks, SRAF, Resolution enhancement technologies, Defect inspection

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top