Ms. Won Sun Kim Profile

Won Sun Kim

Research Staff Member at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 23 September 2009 Paper

Aerial plane inspection for advanced photomask defect detection

Won Sun Kim, Jin Hyung Park, Dong Hoon Chung, Chan Uk Jeon, Han Ku Cho, Trent Hutchinson, Oscar Lee, William Huang, Aditya Dayal

Proc. SPIE. 7488, Photomask Technology 2009

KEYWORDS: Lithography, Reticles, Defect detection, Image processing, Inspection, Image resolution, Wafer inspection, Photomasks, SRAF, Semiconducting wafers

Read Abstract +

Proceedings Article | 23 September 2009 Paper

Inspection of complex OPC patterns for 4x node and beyond

Sang Hoon Han, Wonil Cho, Won-Sun Kim, Dong Hoon Chung, Chan-Uk Jeon, HanKu Cho

Proc. SPIE. 7488, Photomask Technology 2009

KEYWORDS: Reticles, Defect detection, Inspection, Image resolution, Photomasks, Artificial intelligence, Optical proximity correction, SRAF, Semiconducting wafers, Model-based design

Read Abstract +

Proceedings Article | 11 May 2009 Paper

Implementation strategy of wafer-plane and aerial-plane inspection for advanced mask manufacture

Won-Sun Kim, Dong-Hoon Chung, Chan-Uk Jeon, HanKu Cho, William Huang, John Miller, Gregg Inderhees, Becky Pinto, Jiuk Hur, Kihun Park, Jay Han

Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI

KEYWORDS: Lithography, Reticles, Contamination, Inspection, Image resolution, Wafer inspection, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers

Read Abstract +

Proceedings Article | 23 March 2009 Paper

Requirements of the inspection for double patterning technology reticles

Wonil Cho, Won-Sun Kim, Sung-Joon Sohn, Sunpyo Lee, Jihyeon Choi, Yonghoon Kim, HanKu Cho

Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII

KEYWORDS: Reticles, Radon, Defect detection, Inspection, Photomasks, Double patterning technology, Ear, Critical dimension metrology, Semiconducting wafers, Defect inspection

Read Abstract +

Proceedings Article | 14 May 2007 Paper

Cost-effective pattern inspection system using Xe-Hg lamp in challenge of sub-65-nm node

Won Sun Kim, Jin Hyung Park, Dong-Hoon Chung, Sang-Gyun Woo

Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV

KEYWORDS: Defect detection, Deep ultraviolet, Particles, Manufacturing, Lamps, Inspection, Photomasks, SRAF, Resolution enhancement technologies, Defect inspection

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years