Won-Tai Ki
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (15)

Proceedings Article | 4 December 2008 Paper
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Manufacturing, Image quality, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Tolerancing

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Electron beam lithography, Dry etching, Computer simulations, Monte Carlo methods, Photomasks, Cadmium sulfide, Double patterning technology, Convolution, Forward error correction, Vestigial sideband modulation

Proceedings Article | 4 March 2008 Paper
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Statistical analysis, Data modeling, Error analysis, Neural networks, Photomasks, Artificial intelligence, Explosives, Data conversion, Statistical modeling, Neurons

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Semiconductors, Electronics, Manufacturing, Distributed computing, Photomasks, Optical proximity correction, Local area networks, Data centers, Network architectures, Resolution enhancement technologies

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Semiconductors, Lithography, Electronics, Photomasks, Computed tomography, Double patterning technology, Critical dimension metrology, Data conversion, Data centers, Resolution enhancement technologies

Showing 5 of 15 publications
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